Preparation and annealing study of CrTaN coatings on WC-Co

To prevent Co diffusion from cemented carbides at high working temperatures, we fabricated CrTaN coatings by reactive direct current magnetron co-sputtering onto 6 wt.% cobalt cemented carbide substrates, to form diffusion barrier layers. The nitrogen flow ratio, N2/(Ar + N2), during the sputtering process was set at 0.4. The deposition rates of CrTaN coatings varied from 23 to 27 nm/min. The CrTaN coatings crystallized into a columnar structure, without heating the substrates during the sputtering process and exhibited surface hardness and Youngʹs modulus values of 16–27 and 211–383 GPa, respectively. The CrTaN coatings were annealed at 500 and 600 °C for 4 h in air to evaluate the oxidation resistance and diffusion barrier performance. We also investigated oxidation resistance of the CrTaN coatings under a 50 ppm O2–N2 atmosphere, to assess the fabricated layers effectiveness as a protective coating for glass molding dies.