Title of article :
Study of thermal stability and mechanical properties of fcc phase Zr22W19N58 thin films deposited by reactive magnetron sputtering
Author/Authors :
Dubey، نويسنده , , P. and Arya، نويسنده , , V. and Srivastava، نويسنده , , S.K. and Singh، نويسنده , , D. and Chandra، نويسنده , , R.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2014
Abstract :
Thermal stability and mechanical properties of zirconium tungsten nitride (Zr–W–N) thin films have been studied. Nano-structured Zr–W–N thin films have been deposited on Si (100) substrates by reactive magnetron sputtering at varying substrate temperatures Ts (100°–600 °C). For 100 °C ≤ Ts ≤ 600 °C, X-ray diffraction patterns of the films show a crystalline fcc phase with (111) and (200) preferred crystallographic orientations of grains. Maximum wear resistance (H/Er ~ 0.22) and maximum resistance to fatigue fracture (H3/Er2 ~ 1.0 GPa) have been obtained for the film deposited at Ts = 400 °C. Post annealing of the films deposited at 400 °C has been carried out in air from 100°–600 °C. Oxygen starts to be incorporated at 300 °C and films begin to peel off above 400 °C due to increase in oxygen incorporation. Hardness and elastic modulus of annealed films increase with increasing strain.
Keywords :
Zr–W–N thin films , Magnetron sputtering , thermal stability , mechanical properties , X-ray diffraction
Journal title :
Surface and Coatings Technology
Journal title :
Surface and Coatings Technology