Author/Authors :
Liu، نويسنده , , Xiangmei and Wu، نويسنده , , Shuilin and Chan، نويسنده , , Y.L. and Chu، نويسنده , , Paul K. and Chung، نويسنده , , C.Y. and Chu، نويسنده , , C.L. and Yeung، نويسنده , , K.W.K. and Lu، نويسنده , , W.W. and Cheung، نويسنده , , K.M.C. and Luk، نويسنده , , K.D.K.، نويسنده ,
Abstract :
NiTi shape memory alloy samples were plasma-implanted with nitrogen at voltages ranging from −10 to −40 kV. X-ray photoelectron spectroscopy results disclose the formation of gradient TiN layers which thicknesses and elemental in-depth distributions depend on the applied voltages. The effects of the implantation voltages on the wear characteristics were investigated by pin-on-disk tests. In the initial period of our friction test, the implanted samples exhibit low friction coefficients compared to the untreated sample. The wear resistance of the plasma-implanted NiTi samples increases with implantation voltages and decreases with the applied loads. Our results reveal that the wear mechanism of the implanted samples is adhesive-dominant under low applied loads but becomes abrasive-dominant at high applied loads.
Keywords :
Plasma immersion ion implantation , structure , WEAR , Nickel titanium shape memory alloy