مرکز منطقه ای اطلاع رساني علوم و فناوري - Use of angle-resolved XPS to determine depth profiles based on Fick’s second law of diffusion: description of method and simulation study

Title of article :

Use of angle-resolved XPS to determine depth profiles based on Fick’s second law of diffusion: description of method and simulation study

Author/Authors :

Jie Diao and Dennis W. Hess، نويسنده ,

Issue Information :

روزنامه با شماره پیاپی سال 2004

Pages :

From page :

To page :

104

Keywords :

Angle-resolved X-ray photoelectron spectroscopy (ARXPS) , diffusion , depth profile

Journal title :

JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA

Serial Year :

2004

Journal title :

JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA

Record number :

379958

Link To Document :