• Title of article

    Evolution

  • Author/Authors

    Masamichi Yoshimura، نويسنده , , Kazuyuki Ueda، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1997
  • Pages
    4
  • From page
    179
  • To page
    182
  • Abstract
    We have examined atomistic processes of hydrogen desorption from the View the MathML source surface by scanning tunneling microscopy (STM). At a low hydrogen dose, Si atoms are etched from the surface and the patched pattern of 2 × 1 and 1 × 2, where each step edge penetrates into neighboring steps, is observed. On the other hand, a quasi-stable c(4 × 4) surface reconstruction is observed for high doses of hydrogen before the complete recovery of the 2 × 1 structure. It is found that the formation of the c(4 × 4) structure needs a rather large density of vacancies and that the domains are pinned at the clusters and disordered areas on the surface.
  • Keywords
    Scanning tunneling microscopy , Etching , Silicon , Hydrogen , Surface defects , Surface diffusion
  • Journal title
    Applied Surface Science
  • Serial Year
    1997
  • Journal title
    Applied Surface Science
  • Record number

    992017