Title of article
Periodic changes in surface microroughness with progress of thermal oxidation of silicon
Author/Authors
Takeo Hattori، نويسنده , , Masaaki Fujimura، نويسنده , , Tomoyuki Yagi، نويسنده , , Masatoshi Ohashi، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1998
Pages
4
From page
87
To page
90
Abstract
The periodic changes in surface microroughness of thermal oxide films formed on Si(100) surface with a period in thickness of 0.18 nm were discovered using a noncontact-mode atomic force microscope. This observation combined with structural studies of the interface implies that the layer-by-layer oxidation occurs locally.
Journal title
Applied Surface Science
Serial Year
1998
Journal title
Applied Surface Science
Record number
992178
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