Title of article
Optical characterization of vapour-deposited amorphous As S Ag films
Author/Authors
A.H Moharram، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
6
From page
39
To page
44
Abstract
The transmittance spectra of the thermally evaporated As25S65Ag10 thin films were measured in the spectral range 300 to
900 nm. The analysis proposed by Swanepoel wR. Swanepoel, J. Phys. E 16 1983.1214x, enabling the determination of the
refractive index n. and layer thickness d., has successfully been applied. The dispersion of n is discussed in terms of the
single-oscillator Wemple and DiDomenico model. The energy of the single oscillator increases while the high-frequency
dielectric constant decreases as a result of 1 h isothermal heating of the as-deposited films up to 450 K. The spectral
dependence of the absorption coefficient of the films indicates that ‘non-direct transition’ is the responsible mechanism for
the photon absorption. Crystallization of the orthorhombic arsenic sulphide As2S5.phase after thermal annealing at 470 K
reduces the optical gap of the as-prepared film down to 1.41 eV. q1999 Elsevier Science B.V. All rights reserved.
Keywords
As25S65Ag10 thin film , Thermal annealing , refractive index
Journal title
Applied Surface Science
Serial Year
1999
Journal title
Applied Surface Science
Record number
995384
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