XRD and Raman study of vanadium oxide thin films deposited on fused silica substrates by RF magnetron sputtering

Highly oriented VO2(B), V6O13, and V2O5 thin films have been deposited on fused silica substrates by RF magnetron sputtering. X-ray diffraction characterization revealed that all the three films were single phases and strongly oriented with the (0 0 1) planes parallel to the substrates. The micro-Raman scattering spectra of the films were reported. The results were compared to the micro-Raman scattering spectra of the film obtained by annealing the as-deposited VO2(B) film. It was found that the surface of the annealed film consisted of three regions of the black V6O13 region, the yellow VO2(B) region and the white non-crystalline region.