Title of article :
Development of compact cluster ion sources using metal cluster complexes Ionization properties of metal cluster complexes
Author/Authors :
T. Mizota*، نويسنده , , H. Nonaka، نويسنده , , T. Fujimoto، نويسنده , , A. Kurokawa، نويسنده , , S. Ichimura، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
4
From page :
945
To page :
948
Abstract :
In order to develop a new compact cluster ion source as a low damage sputtering source for SIMS to analyze ultra-shallow dopant state we have studied the possibility of using a metal cluster complex as an ion beam source. Metal cluster complexes such as Os3(CO)12 and Ir4(CO)12 have been studied from the view point of their stability in high vacuum and how to ionize them by using the electron ionization QMS and the XeCl laser ionization TOF. In the case of electron ionization QMS, peaks of Os3(CO)nþ (n ¼ 0–12) and Ir4(CO)nþ (n ¼ 0–12) were observed without the fragment ions such as a monomer, a dimer, etc. In the case of laser ionization TOF, peaks of the fragment and the parent ions without a carbonyl ligand were observed from Os3(CO)12, and Ir4(CO)12. The temperature dependence of fragmentation has also been discussed. # 2004 Elsevier B.V. All rights reserved
Keywords :
Metal cluster complex , Cluster ion source , TOF , QMS
Journal title :
Applied Surface Science
Serial Year :
2004
Journal title :
Applied Surface Science
Record number :
998628
Link To Document :
بازگشت