Title of article :
Development of compact cluster ion sources using
metal cluster complexes
Ionization properties of metal cluster complexes
Author/Authors :
T. Mizota*، نويسنده , , H. Nonaka، نويسنده , , T. Fujimoto، نويسنده , , A. Kurokawa، نويسنده , , S. Ichimura، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Abstract :
In order to develop a new compact cluster ion source as a low damage sputtering source for SIMS to analyze ultra-shallow
dopant state we have studied the possibility of using a metal cluster complex as an ion beam source. Metal cluster complexes
such as Os3(CO)12 and Ir4(CO)12 have been studied from the view point of their stability in high vacuum and how to ionize them
by using the electron ionization QMS and the XeCl laser ionization TOF. In the case of electron ionization QMS, peaks of
Os3(CO)nþ (n ¼ 0–12) and Ir4(CO)nþ (n ¼ 0–12) were observed without the fragment ions such as a monomer, a dimer, etc. In
the case of laser ionization TOF, peaks of the fragment and the parent ions without a carbonyl ligand were observed from
Os3(CO)12, and Ir4(CO)12. The temperature dependence of fragmentation has also been discussed.
# 2004 Elsevier B.V. All rights reserved
Keywords :
Metal cluster complex , Cluster ion source , TOF , QMS
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science