Influence of Ni content on surface morphology and variable-range hopping parameters of C/Ni films

In this work, the films were grown by radio frequency magnetron co–sputtering on glass substrates at room temperature. The conductivity in the temperature range T<50 K of the films was described in terms of variable-range hopping (VRH) conduction. The film deposited at 3.92 % has minimum values the average hopping distance Rhop about 3.43x10-6 (It is found that the films deposited at 3.92 % has minimum values the topographyabout 3 nm