Relation between current-temperature dependent and surface topography of carbon films embedded by Ni nanoparticles films

In this work, carbon films embedded by Ni nanoparticles were grown by radio frequency magnetron sputtering at room temperature on glass substrates. Films are synthesized under four deposition processingusing mosaic targets made of carbon and nickel with Ni surface areas 1.78, 3.21, 3.92 and 4.64 %. With increasing Ni surface areafrom 1.78 to 3.92 % interconnection between Ni nanoparticles fills which it can be due to diffuse of Ni particles andsome continuous paths of Ni particles for films deposited at 3.92 % are formed. With increasing Ni content from 3.92 to 4.64 % a number of these particles aggregate and metallic paths break down.This transition is explainable by variation of current with temperature of films in temperature range 15-500 K