DocumentCode :
1000081
Title :
Anisotrophy control of Ni-Fe films through sequenced-field deposition
Author :
Beam, W.R. ; Siegle, W.T.
Author_Institution :
IBM Research Center, Yorktown Heights, N.Y.
Volume :
1
Issue :
1
fYear :
1965
fDate :
3/1/1965 12:00:00 AM
Firstpage :
66
Lastpage :
67
Abstract :
Anisotropy of nickel-iron films of 82, 74, and 66 per cent nickel compositions was controlled by time-sequenced application of orthogonal fields during deposition. Resulting anisotropy values are in agreement with simple M -induced anisotropy principles. Coercive forces show small but definite decrease with anisotropy constant. Dispersion angle is proportional to the reciprocal of the anisotropy constant. The technique is suitable for production of low-Hkfilms. It permits nonanomalous inverted films to be produced and allows the study of other anisotropy sources.
Keywords :
Iron-nickel films; Magnetic anisotropy; Nickel-iron films; Anisotropic magnetoresistance; Magnetic anisotropy; Magnetic field measurement; Magnetic films; Magnetostatics; Nickel; Perpendicular magnetic anisotropy; Relays; Substrates; Torque measurement;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1965.1062914
Filename :
1062914
Link To Document :
بازگشت