Title :
Impact of NBTI on the temporal performance degradation of digital circuits
Author :
Paul, Bipul C. ; Kang, Kunhyuk ; Kufluoglu, Haldun ; Alam, Muhammad A. ; Roy, Kaushik
Author_Institution :
Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
Abstract :
Negative bias temperature instability (NBTI) has become one of the major causes for reliability degradation of nanoscale circuits. In this letter, we propose a simple analytical model to predict the delay degradation of a wide class of digital logic gate based on both worst case and activity dependent threshold voltage change under NBTI. We show that by knowing the threshold voltage degradation of a single transistor due to NBTI, one can predict the performance degradation of a circuit with a reasonable degree of accuracy. We find that digital circuits are much less sensitive (approximately 9.2% performance degradation in ten years for 70 nm technology) to NBTI degradation than previously anticipated.
Keywords :
circuit reliability; circuit stability; logic circuits; logic gates; network analysis; NBTI degradation; circuit reliability; circuit stability; delay degradation; digital circuit degradation; digital logic gate; negative bias temperature instability; temporal performance degradation; threshold voltage degradation; Analytical models; Atomic layer deposition; Degradation; Delay estimation; Digital circuits; MOSFETs; Niobium compounds; Temperature; Threshold voltage; Titanium compounds; Negative bias temperature instability (NBTI); performance degradation; threshold voltage degradation;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2005.852523