DocumentCode :
1001914
Title :
Room-temperature pulsed operation of GaxIn1¿xAsyP1¿y/Gax´In1¿x´Asy´P1¿y´ DH visible injection laser grown on (100) GaAs by a two-phase-solution technique
Author :
Kawanishi, H. ; Aota, Tomoyuki ; Iwakami, Tetsuro
Author_Institution :
Kogakuin University, Department of Electronic Engineering, Tokyo, Japan
Volume :
20
Issue :
6
fYear :
1984
Firstpage :
263
Lastpage :
264
Abstract :
Room-temperature pulsed operation of a GaxIn1¿xAsyP1¿y/Gax´In1¿x´Asy´P1¿y´ double-heterostructure visible injection laser diode is reported. The laser diode is grown by liquid-phase epitaxy on (100) GaAs, and the active layer is grown by a two-phase-solution technique. The threshold current density is 16 kA/cm2 for the laser diode lasing at about 721 nm at room temperature.
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; semiconductor epitaxial layers; semiconductor junction lasers; (100) GaAs; GaxIn1-xAsyP1-y/Ga x´In1-x´Asy´P1- -y´; III-V semiconductors; double-heterostructure visible injection laser diode; information processing; information storage systems; liquid-phase epitaxy; room temperature pulsed operation; threshold current density; two-phase-solution technique;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19840176
Filename :
4249790
Link To Document :
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