• DocumentCode
    1003702
  • Title

    Strained p-channel InGaSb/AlGaSb modulation-doped field-effect transistors

  • Author

    Lott, James A. ; Klem, John F. ; Wendt, J.R.

  • Author_Institution
    Sandia Nat. Labs., Albuquerque, NM, USA
  • Volume
    28
  • Issue
    15
  • fYear
    1992
  • fDate
    7/16/1992 12:00:00 AM
  • Firstpage
    1459
  • Lastpage
    1460
  • Abstract
    Strained In0.25Ga0.75Sb p-channel modulation-doped field-effect transistors with Al0.75Ga0.25Sb Be-doped barrier layers are demonstrated. The extrinsic normalised transconductances for 1.2 mu m gate length devices range from 33 to 51 mS/mm at 300 K and from 132 to 161 mS/mm at 77 K. At 300 K, the devices operated in depletion mode with a threshold voltage of approximately 0.3 V, a normalised output conductance of less than 3mS/mm, and maximum drain current densities of approximately 20mA/mm. The devices show promise for complementary heterojunction field-effect transistor logic applications.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; indium antimonide; 1.2 micron; 3 mS; 33 to 161 mS; 77 to 300 K; Be-doped barrier layers; In 0.25Ga 0.75Sb-Al 0.75Ga 0.25Sb:Be; MODFET; complementary heterojunction; depletion mode; extrinsic normalised transconductances; field-effect transistors; logic applications; modulation-doped; strained p-channel; threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19920928
  • Filename
    256073