DocumentCode
1005086
Title
Film growth characterization of an underlayer for perpendicular magnetic recording
Author
Jhingan, A.K. ; Dubin, R.R. ; Herte, L.F. ; Jhingan, A. ; Dubin, Ran ; Herte, L.
Author_Institution
Memorex Corporation, Santa Clara, CA, USA
Volume
20
Issue
5
fYear
1984
fDate
9/1/1984 12:00:00 AM
Firstpage
779
Lastpage
781
Abstract
This investigation involves a study of the dependence of the crystal texture of sputtered Ni-Fe films on film thickness and the oxygen content of the sputtering gas. X-ray diffraction, analytical transmission electron microscopy, and scanning auger microprobe analysis have been employed to characterize the films. The
Keywords
Nickel materials/devices; Sputtering; Crystal microstructure; Crystalline materials; Grain size; Magnetic films; Magnetic materials; Perpendicular magnetic recording; Semiconductor films; Sputtering; Substrates; X-ray diffraction;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1984.1063378
Filename
1063378
Link To Document