DocumentCode
1005771
Title
Transmission electron microscopy of amorphous Fe-Tb thin films irradiated by pulsed laser beam
Author
Tsukahara, Sonoko ; Yokoyama, Yuko ; Tanaka, Toshio ; Kokubu, Akio
Author_Institution
Electrotechnical Laboratory, Tokyo, Japan
Volume
20
Issue
5
fYear
1984
fDate
9/1/1984 12:00:00 AM
Firstpage
1308
Lastpage
1310
Abstract
Amorphous Tb-Fe films were prepared on thin carbon films and glass substrates by r.f. sputtering method. They were irradiated by pulsed laser beams, the energy range of which was that commonly adopted for thermo-magnetic recording. Thermal effects were studied mainly by transmission electron microscopy. Structure of the irradiated areas changed from amorphous to crystalline, while magnetization of the corresponding area turned from perpendicular to in-plane orientation. Degree and diameter of a thermally influenced area depended largely on the film thickness over the range from 200 to 2000 Å. In a 500 Å Tb30 Fe70 film on a thin carbon substrate a circular area of 0.8 μm in diameter was crystallized by one 1 μs pulse of 2 mW. The damage was more evident in thinner films.
Keywords
Amorphous magnetic films/devices; Magnetooptic memories; Amorphous materials; Crystallization; Electron beams; Glass; Laser beams; Optical pulses; Sputtering; Substrates; Transistors; Transmission electron microscopy;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1984.1063437
Filename
1063437
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