DocumentCode :
1005797
Title :
Comparative reliability study of GaAs power MESFETs: mechanisms for surface-induced degradation and a reliable solution
Author :
Dumas, J.M. ; Lecrosnier, D. ; Paugam, J. ; Vuchener, C.
Author_Institution :
CNET, LAB/ICM, Lannion, France
Volume :
21
Issue :
3
fYear :
1985
Firstpage :
115
Lastpage :
116
Abstract :
A gradual degradation has been observed in the RF performance of GaAs power FETs. Electrical and physical analyses have been carried out, indicating the role played by the surface. A plasma enhanced chemical vapour deposited silicon nitride film is established as a suitable surface passivation.
Keywords :
III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; passivation; power transistors; reliability; GaAs power MESFET; RF performance; plasma enhanced CVD Si3N4; reliability; surface passivation; surface-induced degradation;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19850080
Filename :
4250890
Link To Document :
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