Title :
Grain growth of rapid quenching high silicon-iron alloys
Author :
Arai, K.I. ; Tsutsumitake, H. ; Ohmori, K. ; Arai, Kenta ; Tsutsumitake, H. ; Ohmori, Kenji
Author_Institution :
Tohoku University, Sendai, Japan
fDate :
9/1/1984 12:00:00 AM
Abstract :
In 6.5wt% silicon-iron ribbons prepared by a rapid quenching roll method, grains of 10μm in diameter were observed to grow from surfaces to the inner part of ribbons. When the annealing temperature was about 700°C, the primary recrystallization was observed near the middle of the ribbon thickness, and at the annealing temperature of 950°C, the grain size became 30-40μm. When ribbons were annealed at 1100°C, grains grew with a
Keywords :
Annealing; Argon; Furnaces; Grain size; Iron; Magnetostriction; Saturation magnetization; Silicon alloys; Soft magnetic materials; Temperature;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1984.1063487