• DocumentCode
    1010213
  • Title

    Digital Circuit Design Challenges and Opportunities in the Era of Nanoscale CMOS

  • Author

    Calhoun, By Benton H ; Cao, Yu ; Li, Xin ; Mai, Ken ; Pileggi, Lawrence T. ; Rutenbar, Rob A. ; Shepard, Kenneth L.

  • Author_Institution
    Virginia Univ., Charlottesville
  • Volume
    96
  • Issue
    2
  • fYear
    2008
  • Firstpage
    343
  • Lastpage
    365
  • Abstract
    Well-designed circuits are one key ldquoinsulatingrdquo layer between the increasingly unruly behavior of scaled complementary metal-oxide-semiconductor devices and the systems we seek to construct from them. As we move forward into the nanoscale regime, circuit design is burdened to ldquohiderdquo more of the problems intrinsic to deeply scaled devices. How this is being accomplished is the subject of this paper. We discuss new techniques for logic circuits and interconnect, for memory, and for clock and power distribution. We survey work to build accurate simulation models for nanoscale devices. We discuss the unique problems posed by nanoscale lithography and the role of geometrically regular circuits as one promising solution. Finally, we look at recent computer-aided design efforts in modeling, analysis, and optimization for nanoscale designs with ever increasing amounts of statistical variation.
  • Keywords
    CMOS logic circuits; circuit CAD; integrated circuit interconnections; nanoelectronics; nanolithography; clock distribution; computer-aided design; digital circuit design; geometrically regular circuits; logic circuit interconnects; memories; nanoscale CMOS; nanoscale lithography; power distribution; scaled complementary metal-oxide-semiconductor devices; simulation models; CMOS digital integrated circuits; Circuit synthesis; Clocks; Digital circuits; Integrated circuit interconnections; Logic circuits; MOS devices; Nanoscale devices; Power distribution; Power system interconnection; Clock distribution; complementary metal–oxide–semiconductor (CMOS); complementary metal–oxide–semiconductor (CMOS); device scaling; digital circuits; lithography; logic; manufacturability; memory; optimization; power distribution; regular circuit fabrics; statistical variability; yield;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IEEE
  • Publisher
    ieee
  • ISSN
    0018-9219
  • Type

    jour

  • DOI
    10.1109/JPROC.2007.911072
  • Filename
    4403891