• DocumentCode
    1010543
  • Title

    A new higher ambient transistor

  • Author

    Bowe, Jeffrey J.

  • Author_Institution
    AF Cambridge Res. Ctr., Laurence G. Hanscom Feild, Bedford, Mass
  • Volume
    3
  • Issue
    3
  • fYear
    1956
  • fDate
    7/1/1956 12:00:00 AM
  • Firstpage
    121
  • Lastpage
    123
  • Abstract
    Interest in high speed transistor switching circuits whose operation is unaffected by large changes in ambient temperature led to an investigation of silicon-germanium alloy point-contact transistors because of the larger forbidden energy gap of silicon-germanium alloys. In germanium transistors, as far as temperature stability is concerned, Ic0is particularly poor. Ic0is the value of collector current, at a given collector voltage, with no emitter current. The Ic0of germanium units tested rose rather linearly from 20°C. to about 65°C., with a gradient of 25 µa/°C. but then entered a region of run away. A number of point-contact transistors have been manufactured using 3 per cent silion-germanium (10 ohm-cm, n-type), and the parameters r11, r12, r22, α, fc0and Ic0at room temperature, and values of Ic0as a function of temperature have been measured. Results show that 3 per cent silicon-germanium transistors are as good as germanium transistors in all respects and better in temperature stability. The values of Ic0for silicon-germanium transistors rose linearly from 18° to about 95°C., with a gradient comparable to that of the germanium units below 65°C.
  • Keywords
    Circuit stability; Electron beams; Electron traps; Explosions; Gaussian processes; Germanium silicon alloys; Plasma temperature; Silicon alloys; Silicon germanium; Stability; Switching circuits; Temperature; Testing;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IRE Transactions on
  • Publisher
    ieee
  • ISSN
    0096-2430
  • Type

    jour

  • DOI
    10.1109/T-ED.1956.14170
  • Filename
    1472089