Title :
Fabrication of antimony oxide-doped silica fibres by the VAD process
Author :
Shimizu, M. ; Ohmori, Y. ; Nakahara, M.
Author_Institution :
NTT Ibaraki Electrical Communication Laboratory, Tokai, Japan
Abstract :
Antimony oxide-doped silica fibres were fabricated by the VAD process. To fabricate the low-loss and low-OH content fibres, the presintering technique was developed for the dehydration and consolidation process. As a result, the minimum loss value and the residual OH ion content were 7.0 dB/km at 1.65 ¿m and 50 parts in 109 respectively.
Keywords :
antimony compounds; chemical vapour deposition; optical fibres; optical workshop techniques; silicon compounds; SiO2:Sb2O3; VAD process; consolidation; dehydration; low-OH content; low-loss; minimum loss value; optical fibres; presintering technique;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19850615
