• DocumentCode
    1018034
  • Title

    Very low OH content P2O5-doped silica fibres

  • Author

    Ohmori, Yasuji ; Okazaki, Hisaaki ; Hatakeyama, Iwao ; Takata, Hisao

  • Author_Institution
    NTT Ibaraki Electrical Communication Laboratory, Tokai, Japan
  • Volume
    15
  • Issue
    20
  • fYear
    1979
  • Firstpage
    616
  • Lastpage
    618
  • Abstract
    Very low OH content optical fibres consisting of P2O5-doped silica core and GeO2-P2O5-B2O3-doped silica cladding were fabricated by the m.c.v.d. technique. The relation between the OH absorption loss and the deposition temperature was clarified. The OH content in this fibre could be reduced to about seven parts per billion (~ 7 × 10¿9) by using a low deposition temperature.
  • Keywords
    chemical vapour deposition; optical fibres; CVD; GeO2-P2O5-B2O3 doped silica cladding; OH ion absorption loss; P2O5 doped silica core; deposition temperature; silica optical fibres;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19790440
  • Filename
    4256051
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1018034