Title :
Effect of pH on crystallographic orientation of plated cobalt films
Author_Institution :
IBM Corporation, La Jolla, California
fDate :
1/1/1987 12:00:00 AM
Abstract :
Data is presented which contrasts the crystallographic and magnetic properties of films plated at low and at high pH. Plating from a simple CoSO4bath, an abrupt transition in preferred orientation is observed to occur in the region of pH 4, from orientation of the hexagonal c-axis predominantly parallel to the plane of the films below a pH of 4.0 changing to c-axis orientation predominantly perpendicular to the film plane in the pH range 4.0-6.5, together with corresponding changes in magnetic properties. A mechanism based on hydrolysis of Cobalt ions at the cathode interface is proposed to explain this behavior, which is supported by results from plating baths containing Boric acid.
Keywords :
Magnetic recording; Atomic measurements; Cathodes; Cobalt; Crystallography; Electrical resistance measurement; Graphics; Magnetic films; Magnetic properties; Magnetic recording; Surface resistance;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1987.1064755