Control of coercive force of Co-Cr sputtered films

Author

Niimura, Yoshiro ; Nakagawa, Shigeki ; Naoe, Masahiko

Author_Institution

Tokyo Institute of Technology, Meguro-Ku, Tokyo, Japan

Volume

23

Issue

1

fYear

1987

fDate

1/1/1987 12:00:00 AM

Firstpage

68

Lastpage

70

Abstract

The role of c-axis orientation of the crystallites in the sputtered Co-Cr thin films has been investigated aiming for the control of the coercive force of the film. It has been confirmed that the c-axis orientation plays a very important role to control the coercive force, Hc $\\perp$ and Hc $\\parallel$ . When the c-axis of the film is well oriented, only Hc $\\perp$ changes with the increase of the substrate temperature Ts leaving Hc $\\parallel$ rather constant. However, both Hc $\\perp$ and Hc $\\parallel$ change together with the increase of Ts when the film is poorly oriented. It has been considered that Ts is only the factor adjustable for controlling Hc of the films, but the results in this study indicate that the c-axis orientation is the another factor to control Hc $\\perp$ and Hc $\\parallel$ , separately.

Keywords

Magnetic thermal factors; Perpendicular magnetic recording; Sputtering; Coercive force; Force control; Human computer interaction; Magnetic films; Magnetic properties; Magnetic recording; Perpendicular magnetic anisotropy; Perpendicular magnetic recording; Sputtering; Substrates;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/TMAG.1987.1064816

Filename

1064816