DocumentCode :
1024396
Title :
Migration rates of alkali ions in thermally-grown SiO2films
Author :
Logan, Jeremy S. ; Kerr, D.R.
Volume :
12
Issue :
9
fYear :
1965
fDate :
9/1/1965 12:00:00 AM
Firstpage :
503
Lastpage :
503
Keywords :
Diodes; Electrons; Gallium arsenide; Gunn devices; III-V semiconductor materials; Impurities; Laboratories; Microwave devices; Radar scattering; Telephony;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1965.15549
Filename :
1474013
Link To Document :
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