• DocumentCode
    1024581
  • Title

    Josephson junctions with silicon interlayer and arrays

  • Author

    Amatuni, L.E. ; Gubankov, V.N. ; Kovtonyuk, S. ; Koshelets, P. ; Ovsyannikov, G.A. ; Serpuchenko, L. ; Vystavkin, A.N.

  • Author_Institution
    Institute of Radio Engineering and Electronics, Moscow, USSR
  • Volume
    23
  • Issue
    2
  • fYear
    1987
  • fDate
    3/1/1987 12:00:00 AM
  • Firstpage
    680
  • Lastpage
    683
  • Abstract
    Dc and microwave properties of the Josephson sandwiches with amorphous silicon interlayer based on refractory materials have been investigated in a wide temperature range. The junctions have nonhysteresis I-V curves down to temperatures 2.2K. Reduced normal state resistance value can be varied in the range RNS = (5-5000) Ω μm2by changing the Si interlayer thickness; the ICRNproducts Vo= (0.3-1) mV at the same time. Experimental data can be explained by resonance mechanism of electrical charge transferring through silicon interlayer. The transfer takes place along impurity resonant trajectories caused by the presence of the localized states in the forbidden band of the amorphous silicon. The mutual locking in the arrays has been investigated providing that there is a loop for ac Josephson currents. Due to a high Vovalue the mutual locking in the two junctions cell has been observed up to the voltage 1 mV which corresponds to submillimeter wavelength.
  • Keywords
    Amorphous semiconductor materials/devices; Josephson devices; Silicon materials/devices; Amorphous materials; Amorphous silicon; Counting circuits; Electrodes; Josephson junctions; Niobium; Radio frequency; Resonance; Sputter etching; Temperature;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1987.1065047
  • Filename
    1065047