DocumentCode
1024581
Title
Josephson junctions with silicon interlayer and arrays
Author
Amatuni, L.E. ; Gubankov, V.N. ; Kovtonyuk, S. ; Koshelets, P. ; Ovsyannikov, G.A. ; Serpuchenko, L. ; Vystavkin, A.N.
Author_Institution
Institute of Radio Engineering and Electronics, Moscow, USSR
Volume
23
Issue
2
fYear
1987
fDate
3/1/1987 12:00:00 AM
Firstpage
680
Lastpage
683
Abstract
Dc and microwave properties of the Josephson sandwiches with amorphous silicon interlayer based on refractory materials have been investigated in a wide temperature range. The junctions have nonhysteresis I-V curves down to temperatures 2.2K. Reduced normal state resistance value can be varied in the range RN S = (5-5000) Ω μm2by changing the Si interlayer thickness; the IC RN products Vo = (0.3-1) mV at the same time. Experimental data can be explained by resonance mechanism of electrical charge transferring through silicon interlayer. The transfer takes place along impurity resonant trajectories caused by the presence of the localized states in the forbidden band of the amorphous silicon. The mutual locking in the arrays has been investigated providing that there is a loop for ac Josephson currents. Due to a high Vo value the mutual locking in the two junctions cell has been observed up to the voltage 1 mV which corresponds to submillimeter wavelength.
Keywords
Amorphous semiconductor materials/devices; Josephson devices; Silicon materials/devices; Amorphous materials; Amorphous silicon; Counting circuits; Electrodes; Josephson junctions; Niobium; Radio frequency; Resonance; Sputter etching; Temperature;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1987.1065047
Filename
1065047
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