DocumentCode
1024757
Title
Large refractive index changes in tunable-electron-density InGaAs/InAlAs quantum wells
Author
Zucker, J.E. ; Chang, T.Y. ; Wegener, M. ; Sauer, N.J. ; Jones, K.L. ; Chemla, D.S.
Author_Institution
AT&T Bell Labs., Holmdel, NJ, USA
Volume
2
Issue
1
fYear
1990
Firstpage
29
Lastpage
31
Abstract
Measurements of electrorefraction and electroabsorption in a multiple-quantum-well waveguide structure in which each InGaAs quantum well is provided with an individual electron reservoir are presented. External bias transfers electrons into the wells, thus quenching the absorption and producing a refractive index change at wavelengths below the bandedge which is linear in the applied voltage. It is shown that in this type of structure both the change in refractive index per applied field and the ratio of optical phase to intensity modulation can be significantly enhanced over those found in the quantum confined Stark effect.<>
Keywords
III-V semiconductors; aluminium compounds; carrier density; electro-optical devices; electroabsorption; gallium arsenide; indium compounds; integrated optics; optical modulation; optical waveguides; refractive index; semiconductor quantum wells; III-V semiconductor; InGaAs-InAlAs; absorption quenching; bandedge; electroabsorption; electrorefraction; external bias; individual electron reservoir; intensity modulation; large refractive index changes; multiple-quantum-well waveguide structure; optical phase; tunable-electron-density InGaAs/InAlAs quantum wells; Absorption; Electron optics; Indium gallium arsenide; Optical modulation; Optical waveguides; Quantum well devices; Refractive index; Reservoirs; Voltage; Wavelength measurement;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/68.47032
Filename
47032
Link To Document