DocumentCode :
1025091
Title :
Solution of semiconductor equations using a fully adaptive mesh strategy
Author :
Armstrong, G.A. ; Ferguson, R.S. ; Flynn, J.G.
Author_Institution :
Queen´s University of Belfast, Department of Electrical Engineering, Belfast, UK
Volume :
22
Issue :
16
fYear :
1986
Firstpage :
856
Lastpage :
858
Abstract :
The letter presents a novel means of mesh adaption when the finite-element method is applied to the semiconductor equations. Using triangular elements it has the ability to avoid obtuse angles while still allowing flexibility in mesh design. The usefulness of the method is demonstrated by a simulation of an MOS device operating at a high drain voltage where generation due to impact ionisation becomes significant.
Keywords :
finite element analysis; impact ionisation; metal-insulator-semiconductor devices; semiconductor device models; drain voltage; fully adaptive mesh strategy; impact ionisation; semiconductor equations; triangular elements;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19860586
Filename :
4256791
Link To Document :
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