DocumentCode
1027092
Title
Magnetic and structural properties of dual ion beam sputtered pure iron films
Author
Ishiwata, N. ; Wakabayashi, C. ; Matsumoto, T. ; Ishiwata, N. ; Wakabayashi, C. ; Matsumoto, Tad
Author_Institution
NEC Home Electronics Ltd., Kawasaki, Japan
Volume
23
Issue
5
fYear
1987
fDate
9/1/1987 12:00:00 AM
Firstpage
2152
Lastpage
2154
Abstract
Pure Iron films have been prepared using Dual Ion Beam Sputtering DIBS apparatus, and the magnetic properties dependence on the crystal structure has been investigated. In this study, the preparation parameters were substrate temperature Ts, acceleration voltage for Ar ions which sputter the target Vacc., and acceleration voltage for assistant Ar ions onto the surface of growing films Vsub.acc.. With an increace in Vacc., the preferred orientation changed from the
Keywords
Ion radiation effects; Crystallization; Ion beams; Iron; Magnetic field measurement; Magnetic films; Magnetic properties; Magnetostriction; Optical films; Reflection; X-ray diffraction;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1987.1065285
Filename
1065285
Link To Document