Title :
Wavelength dependence of optical oxidation of silicon
Author :
Boyd, I.W. ; Micheli, F.
Author_Institution :
University College London, Department of Electronic & Electrical Engineering, London, UK
Abstract :
Using a novel technique to amplify small increases in the oxidation rate of laser-irradiated silicon, we have successfully isolated a photonic contribution to the reaction induced by CW argon laser radiation.
Keywords :
laser beam applications; laser beam effects; oxidation; semiconductor technology; silicon; Ar laser; CW Ar laser radiation; Si oxidation; laser enhanced oxidation of Si; oxidation rate; photonic contribution; wavelength dependence;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19870217
