• DocumentCode
    1031978
  • Title

    Low threshold Nd-doped silica planar waveguide laser

  • Author

    Bonar, J.R. ; Aitchison, J.S. ; Maxwell, G.D. ; Ainslie, B.J.

  • Author_Institution
    Dept. of Electron. & Electr. Eng., Glasgow Univ.
  • Volume
    30
  • Issue
    3
  • fYear
    1994
  • fDate
    2/3/1994 12:00:00 AM
  • Firstpage
    229
  • Lastpage
    230
  • Abstract
    The authors report high power, high slope efficiency, Nd-doped glass waveguide lasers on Si, fabricated by flame hydrolysis deposition (FHD) and reactive ion etching (RIE). The laser was pumped at 804 nm and achieved a lasing threshold of 20 mW, slope efficiencies of 2.6% and output powers of over 1 mW
  • Keywords
    chemical vapour deposition; integrated optics; neodymium; optical waveguides; optical workshop techniques; solid lasers; sputter etching; 1 mW; 20 mW; 804 nm; Nd-doped glass waveguide lasers; SiO2-P2O5:Nd; flame hydrolysis deposition; high power; high slope efficiency; lasing threshold; low threshold Nd-doped silica planar waveguide laser; output powers; reactive ion etching;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19940190
  • Filename
    267223
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1031978