• DocumentCode
    1032292
  • Title

    The effect of 〈100〉 orientation of fabrication on high-density, high-speed monolithic circuits

  • Author

    Grochowski, E.G.

  • Volume
    15
  • Issue
    6
  • fYear
    1968
  • fDate
    6/1/1968 12:00:00 AM
  • Firstpage
    436
  • Lastpage
    436
  • Keywords
    Application specific integrated circuits; Circuit noise; Electron beams; Etching; Fabrication; Image generation; Interference; Lenses; Silicon; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1968.16350
  • Filename
    1475252