Title :
Surface charges and surface potential in silicon surface inversion layers
Author_Institution :
North American Philips Company, Briarcliff Manor, N.Y.
fDate :
12/1/1968 12:00:00 AM
Abstract :
The effect of interface charges on the channel conductance in MOS transistors has been investigated. It has been found that, by measuring the conductance as a function of temperature, it is possible to determine both the "fixed" interface charge which is independent of the surface potential and the charge trapped in surface states whose occupancy is a function of the surface potential. The characteristics of the two charge components are discussed. It appears that neither a continuous nor a delta-function energy distribution alone is adequate to describe the observed surface-state density.
Keywords :
Charge measurement; Current measurement; Electron devices; Electron traps; Gold; Insulation; MOSFETs; Silicon; Solid state circuits; Surface treatment;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1968.16553