DocumentCode :
1037037
Title :
On the origin of uniaxial anisotropy in permalloy thin films
Author :
Fujii, Toshitaka ; Uchiyama, Susumu ; Masuda, Morio ; Sakaki, Yoneichiro
Author_Institution :
Nagoya University, Nagoya, Japan.
Volume :
4
Issue :
3
fYear :
1968
fDate :
9/1/1968 12:00:00 AM
Firstpage :
515
Lastpage :
519
Abstract :
Variation of Hkduring isothermal magnetic annealing has been systematically investigated to make clear the origin of the induced anisotropy in evaporated Permalloy films of the composition ranging from 70- to 90-percent Ni. The anisotropy of films deposited at room temperature comes from six different origins, whose activation energies are E_{1} < 0.2 eV (0.17-0.2 eV), E_{2} \\simeq E_{3} \\simeq 0.5 eV, E_{4} \\simeq E_{5} \\simeq 1.1 eV, and E_{6} = 2.0 eV, respectively. The compositional dependence of contributions from each origin can be used in order to elucidate the whole mechanism of the anisotropy in detail. The component of activation energy from 0.2 to 0.5 eV is closely related to the magnetoelastic anisotropy, while that of 1.1 eV is almost independent of the film composition. The component with the activation energy of 2.0 eV proved to be the same as that found in bulk Permalloy. Furthermore, the effects of the preparation condition of films on the anisotropy are also discussed.
Keywords :
Annealing; Magnetic anisotropy; Permalloy films; Anisotropic magnetoresistance; Annealing; Isothermal processes; Magnetic anisotropy; Magnetic films; Magnetic separation; Magnetostriction; Perpendicular magnetic anisotropy; Sputtering; Transistors;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1968.1066216
Filename :
1066216
Link To Document :
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