Title :
Optimization of the planar hall effect in ferromagnetic thin films for device design
Author_Institution :
University of Toulouse, Toulouse, France
fDate :
9/1/1968 12:00:00 AM
Keywords :
Artificial intelligence; Design optimization; Electrodes; Hall effect; Magnetostatics; Magnetostriction; Substrates; Thin film devices; Transistors; Voltage;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1968.1066340
