DocumentCode :
1038441
Title :
Optically excited resonant beam pressure sensor
Author :
Uttamchandani, D. ; Thornton, K.E.B. ; Culshaw, B.
Author_Institution :
University of Strathclyde, Department of Electronic & Electrical Engineering, Glasgow, UK
Volume :
23
Issue :
25
fYear :
1987
Firstpage :
1333
Lastpage :
1334
Abstract :
Micromechanical silicon beams fabricated by anisotropic etching techniques are coated with a thin layer of chromium. An intensity-modulated laser beam focused on the beam generates transverse vibrations which are detected interferometrically. In the letter we report how the vibration frequency changes with temperature and pressure applied to the beam.
Keywords :
measurement by laser beam; pressure transducers; silicon; Cr thin film; Si beams; anisotropic etching techniques; intensity-modulated laser beam; interferometry; micromechanical beams in silicon; optical fibre compatible; optically excited resonant beam; resonant beam pressure sensor; resonant frequency; temperature; transverse vibrations; vibration frequency;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19870921
Filename :
4259163
Link To Document :
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