Title :
Plasma spread in high-power thyristors under dynamic and static conditions
Author :
Somos, Istvan ; Piccone, Dante E.
Author_Institution :
General Electric Company, Collingdale, Pa.
fDate :
9/1/1970 12:00:00 AM
Abstract :
The plasma spread properties of various thyristors were studied utilizing an infrared viewing technique. The plasma velocity occurring prior to equilibrium, and plasma spread conditions at equilibrium were determined. Velocity versus current density diagrams were generated for low-frequency, high-voltage and high-frequency, low-voltage devices. Effect of the initial turned-on line on plasma spreading is discussed.
Keywords :
Current density; Frequency; Plasma density; Plasma devices; Plasma displays; Plasma properties; Plasma temperature; Thermal resistance; Thyristors; Voltage;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1970.17057
