DocumentCode :
1039078
Title :
InP Bipolar ICs: Scaling Roadmaps, Frequency Limits, Manufacturable Technologies
Author :
Rodwell, Mark J.W. ; Le, Minh ; Brar, Berinder
Author_Institution :
California Univ., Santa Barbara
Volume :
96
Issue :
2
fYear :
2008
Firstpage :
271
Lastpage :
286
Abstract :
Indium phosphide heterojunction bipolar transistors (HBTs) find applications in very wide-band digital and mixed-signal integrated circuits (ICs). Devices fabricated in high-yield process flows at 500 nm feature size obtain 450 GHz cutoff frequencies and 5 V breakdown and enable high yield fabrication of integrated circuits having more than 3000 transistors. Laboratory devices at 250 nm feature size obtain 755 GHz . We describe device and circuit bandwidth limits associated with HBTs, develop scaling roadmaps for HBTs having lithographic minimum feature sizes between 512 and 64 nm, and identify key technological challenges in realizing 480-GHz digital ICs and 1000-GHz amplifiers. Key features of manufacturable self-aligned dielectric sidewall processes are described in detail.
Keywords :
III-V semiconductors; bipolar analogue integrated circuits; bipolar digital integrated circuits; heterojunction bipolar transistors; indium compounds; lithography; mixed analogue-digital integrated circuits; HBT; InP; InP bipolar IC; heterojunction bipolar transistor; laboratory devices; lithography; manufacturable self-aligned dielectric sidewall process; mixed-signal integrated circuits; scaling roadmap; Cutoff frequency; Electric breakdown; Fabrication; Heterojunction bipolar transistors; Indium phosphide; Integrated circuit technology; Integrated circuit yield; Manufacturing; Mixed analog digital integrated circuits; Wideband; Heterojunction bipolar transistors; millimeter-wave circuits; millimeter-wave devices; submillimeter-wave circuits; submillimeter-wave devices;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/JPROC.2007.911058
Filename :
4432795
Link To Document :
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