DocumentCode
1041850
Title
A composite model for Schottky diode barrier height
Author
Eimers, G.W. ; Stevens, E.H.
Volume
18
Issue
12
fYear
1971
fDate
12/1/1971 12:00:00 AM
Firstpage
1185
Lastpage
1186
Abstract
A composite model, which includes both electrostatic screening and an interfacial region, is developed for Schottky diode barrier height. The model is used to calculate barrier height as a function of donor concentration for a gold-on-silicon diode structure. The results show that the influence of electrostatic screening on the barrier height is small and that the barrier height decreases rapidly for donor concentrations greater than 1017cm-3.
Keywords
Boundary conditions; Doping profiles; Electrons; Electrostatics; Gaussian processes; Inspection; Poisson equations; Schottky barriers; Schottky diodes; Semiconductor diodes;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1971.17353
Filename
1476675
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