DocumentCode :
1043848
Title :
High coercive force films of cobalt-nickel with additions of group VA and VIB elements
Author :
Luborsky, Fred E.
Author_Institution :
General Electric Company, Research and Development Center, Schenectady, NY, USA
Volume :
6
Issue :
3
fYear :
1970
fDate :
9/1/1970 12:00:00 AM
Firstpage :
502
Lastpage :
506
Abstract :
This paper describes some of the structure-property relations for Co and CoNi films containing Group VIB additions, i.e., chromium, molybdenum, and tungsten and Group VA additions, i.e., phosphorus, arsenic, antimony, and bismuth. All films were prepared by electrodeposition. The magnetic properties and metallurgical structure of the films with tungsten cover the same range of parameters as produced with the phosphorus films. The quantity of the elements required to achieve the maximum in coercive force increases substantially in the sequence P, As, Sb, and Bi; and in the sequence W, Mo, and Cr. The saturation moment and coercive force both decrease with increase of the concentration of added element required to attain the maximum coercive force. The quantity of the elements required is believed to be related to the ability of the electrolyte to produce a refinement of the grain size of the deposit, and the ability of the element added to segregate to the grain boundaries. The saturation moments of Co with W and P agree with the results expected for solid solutions except at high concentrations. The structure sensitive magnetic properties obtained with CoNiW films are qualitatively interpreted in the same way as for the CoNiP films, i.e., on the basis of a strongly interacting array of fine particles. The alloys containing Cr, Mo, or W possess improved resistance to aging at elevated temperatures and in corrosive environments.
Keywords :
Cobalt-nickel films; Coercive forces; Magnetic films; Nickel-cobalt films; Bismuth; Chromium; Coercive force; Grain boundaries; Grain size; Magnetic films; Magnetic properties; Refining; Solids; Tungsten;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1970.1066850
Filename :
1066850
Link To Document :
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