DocumentCode
1047541
Title
Final stage of the charge-transfer process in charge-coupled devices
Author
Daimon, Yoshiaki ; Mohsen, Amr M. ; McGill, T.C.
Author_Institution
California Institute of Technology, Pasadena, Calif.
Volume
21
Issue
4
fYear
1974
fDate
4/1/1974 12:00:00 AM
Firstpage
266
Lastpage
272
Abstract
The final stages of transfer of charge from under a storage gate is formulated analytically including both fringing-field induced drift and diffusion. Analytic solutions to these equations are presented for constant fringing fields, and a system of equations for spatially varying fields is developed. Approximate solutions for spatially varying fringing fields, when combined with a lumped-parameter model of the self-induced field effects, are shown to give a reasonably accurate representation of the free-charge transfer process.
Keywords
Boundary conditions; Charge coupled devices; Charge transfer; Diffusion processes; Electrodes; Equations; Insulation; Laboratories; Numerical simulation; Shape;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1974.17908
Filename
1477723
Link To Document