• DocumentCode
    1047541
  • Title

    Final stage of the charge-transfer process in charge-coupled devices

  • Author

    Daimon, Yoshiaki ; Mohsen, Amr M. ; McGill, T.C.

  • Author_Institution
    California Institute of Technology, Pasadena, Calif.
  • Volume
    21
  • Issue
    4
  • fYear
    1974
  • fDate
    4/1/1974 12:00:00 AM
  • Firstpage
    266
  • Lastpage
    272
  • Abstract
    The final stages of transfer of charge from under a storage gate is formulated analytically including both fringing-field induced drift and diffusion. Analytic solutions to these equations are presented for constant fringing fields, and a system of equations for spatially varying fields is developed. Approximate solutions for spatially varying fringing fields, when combined with a lumped-parameter model of the self-induced field effects, are shown to give a reasonably accurate representation of the free-charge transfer process.
  • Keywords
    Boundary conditions; Charge coupled devices; Charge transfer; Diffusion processes; Electrodes; Equations; Insulation; Laboratories; Numerical simulation; Shape;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1974.17908
  • Filename
    1477723