Thermomagnetic behavior of hard magnetic thin films

The annealing behavior of hard magnetic films of the Co-M system (M = Ni, P) was followed using differential thermal analysis. These studies showed that the thermal behavior of electrodeposited Co, Co-P, Co-Ni, and Co-Ni-P films is different from that of chemically deposited Co-P films. The most pronounced reaction was found to be exothermic and occurred between 200°C and 300°C. After thermally stabilizing these films at 500°C for 1 hour in a vacuum, the temperature dependence of Hcwas found to depend on additive content and crystallite orientation. Films with low additive contents and hcp