DocumentCode :
1050162
Title :
Linewidth variations in photoresist patterns on profiled surfaces
Author :
Widmann, Dietrich W. ; Binder, Hans
Author_Institution :
Siemens, Munchen, Germany
Volume :
22
Issue :
7
fYear :
1975
fDate :
7/1/1975 12:00:00 AM
Firstpage :
467
Lastpage :
471
Abstract :
Photoresist thickness nonuniformities in the vicinity of profile steps on substrate surfaces lead to linewidth variations of AZ 1350 photoresist geometries. The effect increases with increasing reflectivity of the substrate, decreasing photoresist layer thickness, and decreasing contrast transfer of the exposure system. It is shown that the photoresist linewidth is maximum when the resist thickness is a multiple of half the exposure wavelength in the resist.
Keywords :
Conductors; Etching; Fabrication; Geometry; Lead; Printing; Reflectivity; Resists; Spinning; Substrates;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1975.18163
Filename :
1477998
Link To Document :
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