Title :
Instrumentation for conformable photomask lithography
Author :
Melngailis, John ; Smith, Henry I. ; Efremow, N.
Author_Institution :
Massachusetts Institute of Technology, Lexington, Mass.
fDate :
7/1/1975 12:00:00 AM
Abstract :
A vacuum frame and a multiple mask alignment system for conformable photomask lithography are described. These instruments greatly improve the convenience and adaptability of conformable photomask lithography and may permit the advantages of improved resolution, dimensional control, photoresist profile control, and reduced mask damage to be realized in routine photolithographic production.
Keywords :
Atmosphere; Biomembranes; Instruments; Lithography; Optical control; Printing; Production; Resists; Rubber; Substrates;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1975.18168
