DocumentCode :
1051953
Title :
p-MOSFET parameters at cryogenic temperatures
Author :
Maddox, Roy L.
Author_Institution :
Rockwell International Electronics Operations, Anaheim, CA
Volume :
23
Issue :
1
fYear :
1976
fDate :
1/1/1976 12:00:00 AM
Firstpage :
16
Lastpage :
21
Abstract :
p-channel MOSFET parameters measured at 300 K, 77 K, and 4.2 K are discussed; these include I-V characteristic curves, channel conductance, transconductance, threshold voltage, field effect mobility, and forward and reverse p+n junction characteristics. Some qualitative explanations of the dependence of the data on temperature and substrate doping concentration are given. Interesting LHe phenomena are highlighted and discussed in terms of accepted solid state models.
Keywords :
Cryogenics; Dielectric substrates; Diodes; Doping; Forward contracts; MOSFET circuits; Temperature; Testing; Threshold voltage; Transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1976.18340
Filename :
1478354
Link To Document :
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