DocumentCode :
1052726
Title :
Deep-submicrometer CMOS/SIMOX delay modeling by time-dependent capacitance model
Author :
Lee, M. ; Asada, K.
Author_Institution :
Nippon Motorola Ltd., Tokyo, Japan
Volume :
40
Issue :
10
fYear :
1993
fDate :
10/1/1993 12:00:00 AM
Firstpage :
1897
Lastpage :
1901
Abstract :
A new and generic time-dependent capacitance (NEW-TC) model for propagation delay (speed) in deep-submicrometer-gate CMOS/SIMOX is analytically studied. Theoretical predictions by the NEW-TC model are compared with measurements of the propagation delay in 51-stage ring oscillators. It is found that less than 5% errors are observed between the measured and NEW-TC model performance of a 0.1-μm ring oscillator test circuit. It is also found that an Rd-based model with a proper empirical factor is as good as the NEW-TC model when output capacitance is fixed. It is concluded that the NEW-TC model is better than the conventional models
Keywords :
CMOS integrated circuits; SIMOX; capacitance; delays; semiconductor device models; CMOS/SIMOX delay modeling; deep submicron gate; deep-submicrometer-gate; propagation delay; time-dependent capacitance model; Circuit testing; Electron mobility; MOS devices; MOSFET circuits; Parasitic capacitance; Propagation delay; Ring oscillators; Semiconductor device modeling; Threshold voltage; Transient analysis;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.277357
Filename :
277357
Link To Document :
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