• DocumentCode
    1053503
  • Title

    High-voltage thyristors and diodes made of neutron-irradiated silicon

  • Author

    Platzöder, Karl ; Loch, Karlheinz

  • Author_Institution
    Siemens AG, Werk Halbleiter, Munchen, Germany
  • Volume
    23
  • Issue
    8
  • fYear
    1976
  • fDate
    8/1/1976 12:00:00 AM
  • Firstpage
    805
  • Lastpage
    808
  • Abstract
    Neutron irradiation is a way to produce homogeneous and well-defined phosphorus doping in large diameter silicon crystals. One major application of such silicon is in the field of high-voltage power devices. The relation between resistivity and breakdown voltage determined for neutron-irradiated silicon is in good agreement with the theory of Sze and Gibbons. It is shown that by changing from conventionally doped silicon to neutron-irradiated silicon noticeable increases in the blocking capability of thyristors can be achieved without an increase of the n-base width. Production of power thyristors with blocking voltages of 3 to 5 kV has been successful, indicating that applications of neutron-irradiated silicon have already left the laboratory stage.
  • Keywords
    Conductivity; Crystals; Diodes; Doping; Laboratories; Neutrons; Production; Silicon; Thyristors; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1976.18489
  • Filename
    1478502