DocumentCode :
1055127
Title :
Differences between platinum- and gold-doped silicon power devices
Author :
Miller, Matthew D.
Author_Institution :
RCA Laboratories, Princeton, NJ
Volume :
23
Issue :
12
fYear :
1976
fDate :
12/1/1976 12:00:00 AM
Firstpage :
1279
Lastpage :
1283
Abstract :
Both platinum and gold have been used to reduce lifetimes in fast recovery silicon power devices. There are substantial differences between the energy levels introduced by these impurities. Both impurities introduce acceptor levels which act to reduce hole lifetimes in n-type silicon; however, the gold acceptor is much deeper (Ec- 0.54 eV) than the corresponding platinum acceptor (Ec- 0.26 eV). In p-type material, on the other hand, the two impurities are quite similar; gold introduces a donor at Ev+ 0.35 eV, while the platinum donor is at Ev+ 0.32 eV. In terms of basic physics, this paper establishes guidelines to determine, for a given device type, which lifetime killer should be used to provide optimal performance. Platinum offers improved high-temperature properties and turn-on performance when compared to gold and is a better selection for devices which are switched so rapidly that the turn-off is governed mainly by the high injection lifetime. However, when the switching wave form involves low injection recombination tails, gold is a better choice than platinum.
Keywords :
Diodes; Energy states; Gold; Guidelines; Impurities; Physics; Platinum; Pulse shaping methods; Silicon; Testing;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1976.18650
Filename :
1478663
Link To Document :
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