• DocumentCode
    1056502
  • Title

    Emission uniformity and shot-to-shot variation in cold field emission cathodes

  • Author

    Shiffler, Donald A. ; Luginsland, J. ; Ruebush, M. ; LaCour, M. ; Golby, K. ; Cartwright, K. ; Haworth, M. ; Spencer, T.

  • Author_Institution
    Directed Energy Directorate, Air Force Res. Lab., Kirtland AFB, NM, USA
  • Volume
    32
  • Issue
    3
  • fYear
    2004
  • fDate
    6/1/2004 12:00:00 AM
  • Firstpage
    1262
  • Lastpage
    1266
  • Abstract
    High-power microwave tubes require currents and voltages generally in excess of 1 kA and 100 kV. In the past, these system requirements led to the use of single shot machines, with repetition rates well under 1 Hz. With advances in pulsed power, the Air Force Research Laboratory recently began to investigate the performance of field emission diodes at repetition rate operation. Greater numbers of shots allowed better accuracy in measurements and the application of better statistics to experimental data. In this paper, we report on new measurements that, with better experimental accuracy, show the statistical correlation between emission uniformity and the shot-to-shot variation in diode current. We report on a comparison to particle-in-cell simulations. These comparisons show the importance of randomly occurring nonemission regions on the cathode surface in dictating the spread in current data. These results imply that uniformity, in addition to playing an important role in any electron interaction with radiation, also affects the current stability for any device using these cathodes. Finally, these experiments show that for repetition rate machines, shot-to-shot variation quantified in terms of Gaussian distributions characterized by a standard deviation and skewness, provide a diagnostic capable of inferring beam uniformity in situations where direct uniformity diagnostics prove extremely difficult or impractical.
  • Keywords
    Gaussian distribution; cathodes; electron field emission; microwave tubes; plasma diagnostics; plasma instability; plasma interactions; plasma simulation; plasma transport processes; Gaussian distributions; cathode surface; cold field emission cathodes; current stability; diode current; electron interactions; emission uniformity; high-power microwave tubes; particle-in-cell simulations; randomly occurring nonemission regions; repetition rate machines; shot-to-shot variation; uniformity diagnostics; Cathodes; Current measurement; Electron emission; Electron tubes; Force measurement; Laboratories; Light emitting diodes; Surface morphology; Surface treatment; Voltage; Cold cathode tubes; electron beams; microwave tubes;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2004.827608
  • Filename
    1321289